Product advantages:
Suitable for 4-8 inch wafers, substrates, epitaxial wafers and patterned wafers
Detect particles, pits, bumps, scratches, stains, cracks and other defects
System resolution: 1-10 μ m
No pattern wafer: 180 seconds / wafer when the number of defects is less than 200
Sample display:
Sample 1
Sample 2
Sample 3